Miniaturized and electro-optically active thin-film interference components
PhD Conference of the Quantum Alliance and IMPRS-QST
Multilayer thin-film interference coatings, e.g. dielectric mirrors, beamsplitters, edge- and bandpass filters have become an indispensable part of photonics applications such as laser setups or optical telecommunication. One goal in PhoenixD is to shape optics design towards cost-efficient manufacturing, while fulfilling high precision requirements. At Laser Zentrum Hannover e.V., a miniaturization process was developed for the production of substrate-free, millimeter- to micrometer-sized thin-film coatings.[1,2] These thin-film interference components preserve the high layer thickness accuracy and versatility of the established ion beam sputtering process while enabling hybrid integration in optical micro-platforms or fiber networks. Furthermore, our research focusses on integration of novel electro-optically active materials into thin-film systems. This way, a miniaturized element can become a switchable resonating cavity for a very compact laser modulator b ased on the Pockels effect. References  F. Carstens, H. Ehlers, S. Schlichting, L. Jensen, and D. Ristau, "High-Resolution Optical Broadband Monitoring for the Production of Miniaturized Thin-Film Filters," Optical Interference Coatings, OSA Tech. Digest, pp. WA-7 (2019).  A. K. Rüsseler, F. Carstens, L. Jensen, S. Bengsch, and D. Ristau, "Applying sacrificial substrate technology to miniaturized precision optical thin-film coatings," Adv. Opt. Thin Films VII, Proc. SPIE 11872, 48–55 (2021).