Enabling rotary Atomic Layer Deposition for optical applications
Proceedings of the Optical Interference Coatings Conference
Type: Zeitschriftenaufsatz (non-reviewed)
Ta2O5 and SiO2 films coated by rotary atomic layer deposition were studied. Investigations proved low absorption 3.1 ppm, respectively 6.0 ppm as well as uniformity 1.55 \% and 2.71 \% for growth rates up to 0.18 nm/sec. (e-mail: firstname.lastname@example.org).