J. S. M. Akhtar
M. Lappschies
D. Ristau
M. Ashraf

Optical properties of Nd:YAG, Ti:Sapphire and NdF3-films

Journal of Optoelectronics and Advanced Materials
8
10
2105-2110
2008
Type: Zeitschriftenaufsatz (reviewed)
Abstract
This paper describes the formation and optical characterization of films prepared by conventional electron beam evaporation process. Materials such as Nd:Yttrium Aluminum Garnet (Nd:YAG), Ti: Sapphire and NdF3 were deposited on BK7, Suprasil, Sapphire and YAG substrates. The films were prepared by using pure single crystals of Nd:YAG and Ti: Sapphire with normal Nd and Ti concentration used in bulk crystals for production of lasers. Samples with higher Nd content were also studied in order to enhance the absorption in the film and to see the effect on optical constants, total integrated scattering and absorption. Energy Dispersive Analysis of X-rays (EDAX) confirmed the presence and quantified the elements Nd, Y, Al and O in Nd:YAG films and Ti, Al, O in Ti:Sapphire films. The X-Ray Diffraction measurements indicated the structure of these films. Refractive index n, in-homogeneities and thickness of these films were determined by taking their transmission spectra. Absorption was measured at 1064 nm by laser calorimetric method as per ISO standard ISO 11551. Total Integrated Scattering was also measured as per ISO standard /DIS 13696 at 633 nm.