Integrated photonics has the potential to transform telecommunications and computing as electronic circuits reach their physical limits. This study explores Multiphoton Lithography (MPL), an innovative method for fabricating Photonic Integrated Circuits (PICs) with rapid manufacturability and design flexibility. However, MPL introduces anisotropic surface roughness into 3D-printed structures, influenced by process parameters. Surface roughness, a key metric for assessing print quality, provides an accessible means to evaluate fabrication outcomes. This work investigates ridge waveguides on the photopolymer-on-glass (PoG) platform, combining statistical analysis of surface roughness metrics from Laser Scanning Confocal Microscopy (LSCM) with wave optics simulations in ANSYS Lumerical. Statistical analysis identifies process parameters affecting surface quality, while simulations quantify the impact of roughness on waveguide performance, including propagation losses caused by scattering. This framework links MPL process parameters to optical performance, enabling process optimization and accurate scattering loss calculations for 3D-printed photonic components.