L. Kochanneck
A. Tewes
G.-A. Hoffmann
K. Niiranen
J. Rönn
S. Sneck
A. Wienke
D. Ristau

Enabling rotary Atomic Layer Deposition for optical applications

Proceedings of the Optical Interference Coatings Conference
Type: Zeitschriftenaufsatz (non-reviewed)
Ta2O5 and SiO2 films coated by rotary atomic layer deposition were studied. Investigations proved low absorption 3.1 ppm, respectively 6.0 ppm as well as uniformity 1.55 \% and 2.71 \% for growth rates up to 0.18 nm/sec. (e-mail: l.kochanneck@lzh.de).