LASER - World of PHOTONICS: Optical Components
Contact
Phone: +49 511 2788-238
Email: messe@lzh.de
High Resolution Optical Broadband Monitoring
Motivation
• Precise in situ coating thickness monitoring for production of optical thin-film filters
Function
• Direct broadband measurement of moving substrates on rotating substrate holder in UV to NIR wavelength range
Applications
• Precise deposition control
• Online characterization of coatings
• Automated process control
• Rapid manufacturing of complex optical designs
• Faster development of new coating processes
• Quality control and documentation of production processes
• Increased process yield using advanced simulation, re-optimization and error handling tools
• Modular system, flexible configuration according to customer specification in wavelength range and resolution
Technical data
BBM | HR BBM | |
Wavelength range | 240 - 1000 nm optional IR: 240 - 1700 nm |
|
Spectral resolution | 1 - 1.5 nm IR: 1 - 5 nm |
0.1 - 0.2 nm IR: 0.1 - 3 nm |
Measurement time | 10 µs - 30 ms | |
Wavelength accuracy | < 0.5 nm | |
Reproductibility of 100%-measurement | better ±0.04% | |
Noise of 100%-measurement | < 1% RMS |
Performance and Options
• Software algorithms for data acquisition, thickness determination and process control
• BBM simulation module, including a virtual deposition unit: advanced design stability analysis
• Re-optimization module: online error analysis and automated design refinement for increased yield
• Modular system: options for uniformity measurements on multiple radii, combined transmittance and reflectance measurements, spectral resolution below 1 nm (High Resolution / HR BBM)
• In addition to the standard configuration, customized adaptions, e.g. for spectral range and resolution, are available
Applicability
• System compatibility to nearly all deposition chambers and customer specified
instrumentation
• Best applicability to IAD and sputter deposition processes
rALD Coatings
Motivation
• Rising form complexity of optics
• CNC milling, polishing
• 3D printed, injection molding, casting
• Need of conformal coatings
• Sensitive materials
Function/Properties/ Characteristics
• High conformal, low temperature coatings
• Large areas up to 200 mm diameter
• Low spectral absorption
Applications
• Planar and non-planar optics
• Aspheres, Fresnel lenses, prisms
• Gratings
• Capsuling
• e.g. laser crystals
Parameters
• ~0.14 nm/sec growth rate
• 150°C deposition temperature
Processed material
• 200 nm Ta2O5
• 8’’ silicon wafer
Sample loading
• Direct or via load lock
Outstanding growth rate
• Up to 1000 nm/h
• Temperature range 25-200°C
Batch size
• 7 pieces 200 mm
• 13 pieces 100 mm
• 384 pieces 25 mm
CWDM Filters
Motivation
• Thickness reduction leads to
• less divergence during propagation through filter element
• reduction of beam displacement
• Increase in coupling efficiency
• Only functional layers have to be considered
Function / Properties / Characteristics
• Precise IBS sputtering
• Insertion loss > -0.2 dB at CWL
• Thickness ~ 25 µm
Applications
• Telecom / Datacom
• Coarse Wavelength Division Multiplexing
• Photonic Integrated Circuits
Parameters
• High reflecting zone: 1265 nm – 1617 nm
• Attenuation < -30 dB
• Anti reflection zone: 1305 nm – 1317 nm
• Insertion loss > -0.2 dB
• Size depends on application
• 250 µm x 250 µm for fiber integration
Processing steps
Optical Coatings
Coating technologies
• Ion beam sputtering
• Ion assisted deposition
• Evaporation
Coating types
• AR coatings (single wavelength to broad band, …)
• HR coatings (high finesse, high power, low loss, …)
• Complex Filters (band pass, polarization coupler, …)
• Special substrates (Laser crystals, optical fibers)
• Custom coatings
Applications
• Laser systems
• Space applications
• Astronomy
• Medical applications
• Metrology
Metrology
• Laser-induced damage (ISO 2154-2)
• Laser-induced damage in vacuum (ISO 2154-2)
• Survival tests (ISO 2154-3)
• Absorption Measurements (ISO 11551)
• Cavity-Ring-Down
• Total Scattering
• VUV / DUV spectroscopy
• Durability testing (ISO 9211)
• Spectral photometry 120 nm – 25 µm
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